Nonlinear analysis of the I-V characteristics in Ti/Si and TiSi2/Si Schottky diodes

被引:7
作者
PerezRigueiro, J
Jimenez, C
PerezCasero, R
MartinezDuart, JM
机构
[1] Departamento de Física Aplicada, Universidad Autónoma de Madrid
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1996年 / 14卷 / 04期
关键词
D O I
10.1116/1.588996
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Ti/Si and TiSi2/Si diodes have been prepared by direct current (de) sputtering and rapid thermal processing. Their I-V characteristics from 77 K up to 300 K have been analyzed using a nonlinear least squares method to fit the experimental data. All the experimental data have been fitted using two exponentially dependent currents and a series resistance. Two parameters are fitted for each current: a saturation current and an exponential parameter. As is discussed in the article, one current can be assigned to the thermoionic current, since the exponential parameter fits well to the theoretical value q/kT and therefore a temperature independent Schottky barrier height can be calculated. The second current, which yields an exponential parameter independent of temperature, cannot be assigned to a mechanism of direct tunneling through the barrier. As a result, we have proposed a trap-enhanced tunneling mechanism to explain this current. (C) 1996 American Vacuum Society.
引用
收藏
页码:2623 / 2626
页数:4
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