Thermal expansion studies of electron beam evaporated yttria films on Inconel-718 substrates

被引:12
|
作者
Kirubaharan, A. M. Kamalan [1 ]
Kuppusami, P. [1 ]
Dharini, T. [1 ]
机构
[1] Sathyabama Inst Sci & Technol, Ctr Nanosci & Nanotechnol, Madras 600119, Tamil Nadu, India
关键词
Yttria; High temperature X-ray diffraction; Thermal expansion coefficient; Thermal stress; HIGH-TEMPERATURE OXIDATION; PULSED-LASER DEPOSITION; RESIDUAL-STRESS; OPTICAL-PROPERTIES; PHASE-TRANSITIONS; VITREOUS SILICA; Y2O3; COATINGS; OXIDE; POWDER; MICROSTRUCTURE;
D O I
10.1016/j.surfcoat.2018.09.034
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this paper, phase pure cubic yttrium oxide (Y2O3) films deposited by electron beam physical vapor deposition technique on Inconel-718 substrate at different substrate temperatures (773-973 K) are investigated. The structure and phase evolution in the films of Y2O3 as a function of substrate temperature have been evaluated by X-ray diffraction. Atomic force microscopy and scanning electron microscopy were used to examine the surface roughness and morphology of the as-deposited Y2O3 films. The adhesion behavior of the Y2O3 film with Inconel-718 substrate was investigated using scratch indentation testing. The thermal expansion coefficient (TEC) of Inconel-718 substrate and Y2O3 film coated on Inconel-718 substrate were determined by high temperature Xray diffraction (HTXRD) measurement in the temperature range of 298-1273 K with temperature interval of 100 K. The linear TECs of Inconel-718 and Y2O3 film at 1273 K were found to be 1.22 x 10(-6) K-1 and 7.02 x 10(-6) K-1, respectively. Thermal stability of the Y2O3 coated Inconel-718 substrate tested at 1273 K in air over a period of 100 h is also discussed.
引用
收藏
页码:297 / 305
页数:9
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