Rociletinib, a third generation EGFR tyrosine kinase inhibitor: current data and future directions

被引:22
|
作者
Chuang, Jody C. [1 ]
Salahudeen, Ameen A. [1 ]
Wakelee, Heather A. [2 ]
机构
[1] Stanford Hosp & Clin, Div Hematol & Oncol, Stanford, CA USA
[2] Stanford Univ, Sch Med, Dept Med, Div Oncol, Stanford, CA 94305 USA
关键词
Rociletinib; epidermal growth factor receptor (EGFR); T790M; tyrosine kinase inhibitor; CELL LUNG-CANCER; 1ST-LINE TREATMENT; MET AMPLIFICATION; OPEN-LABEL; PHASE-III; GEFITINIB; MUTATIONS; CHEMOTHERAPY; RESISTANCE; ERLOTINIB;
D O I
10.1517/14656566.2016.1162786
中图分类号
R9 [药学];
学科分类号
1007 ;
摘要
Introduction: Major advances have been made since the discovery of driver mutations and their targeted therapies, especially in the treatment of patients with epidermal growth factor receptor (EGFR) mutations. Despite their initial efficacy in the majority of the patients with such driver mutations, all targeted therapies are limited by the eventual development of resistance mechanisms. Areas Covered: EGFR T790M mutation is a common resistance mechanism after treatment with first or second generation EGFR tyrosine kinase inhibitors (TKI). Rociletinib is one of the third generation EGFR TKIs with activity against T790M and activating EGFR mutations while sparing the wild-type EGFR. In this review, we discuss the current understanding and available data on rociletinib, including the side effects associated with the medication. We will also review the BEAMing plasma test to detect T790M mutation without the need for repeat biopsy. Lastly, we review the potential resistance mechanisms after progression on rociletinib, and future directions. Expert Opinion: It is important to note that there are other 3rd generation EGFR TKIs with activity against T790M already approved by the US FDA (osimertinib) and many others in development. Future research will focus on figuring out which patients can benefit the most from a particular medication with minimal side effects, and further resistance mechanisms after rociletinib.
引用
收藏
页码:989 / 993
页数:5
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