Jacobi-Fourier phase masks to increase performance of wavefront coded optical systems for random or varying aberrations alleviation

被引：0

作者：

Olvera-Angeles, Miguel ^{[1
]}

Gonzalez-Amador, Enrique ^{[1
]}

Arines, Justo ^{[2
]}

Sasian, J. ^{[3
]}

Schwiegerling, J. ^{[3
]}

Acosta, Eva ^{[1
]}

机构：

[1] Univ Santiago de Compostela, Dept Appl Phys, Fac Phys, Santiago De Compostela 15782, Spain

[2] Univ Santiago de Compostela, Fac Opt & Optometry, Dept Appl Phys, Santiago De 15782, Spain

[3] Univ Arizona, Coll Opt Sci, 1630 E Univ Blvd, Tucson, AZ 85721 USA

来源：

2019 24TH MICROOPTICS CONFERENCE (MOC) | 2019年

关键词：

INVARIANT; FIELD; DEPTH;

D O I：

10.23919/moc46630.2019.8982760

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Wavefront Coding is a technique using generalized aspheric optics and digital signal processing to greatly increase the depth of field of imaging systems. In this work we propose the use of Jacobi-Fourier shaped phase masks to produce sharp and clear images for optical systems affected by random and varying aberrations.

引用

页码：94 / 95

页数：2

共 4 条

[1] Jacobi-Fourier phase masks to increase performance of wavefront-coded optical systems for random or varying aberration alleviation
Olvera-Angeles, Miguel
Gonzalez-Amador, Enrique
Arines, Justo
Sasian, J.
Schwiegerling, J.
Acosta, Eva
JAPANESE JOURNAL OF APPLIED PHYSICS, 2020, 59 (SO)
[2] Wavefront coding with Jacobi-Fourier phase masks
Gonzalez-Amador, E.
Padilla-Vivanco, A.
Toxqui-Quitl, C.
Olvera-Angeles, M.
Arines, J.
Acosta, E.
CURRENT DEVELOPMENTS IN LENS DESIGN AND OPTICAL ENGINEERING XX, 2019, 11104
[3] Wavefront coding with Jacobi-Fourier phase masks for retinal imaging
Acosta, Eva
Olvera-Angeles, Miguel
Gonzalez-Amador, Enrique
Sasian, J.
Schwiegerling, J.
Arines, Justo
APPLIED OPTICS, 2020, 59 (22) : G234 - G238
[4] Choice of Jacobi-Fourier phase masks for wavefront coding under different f-number
Gonzalez-Amador, Enrique
Padilla-Vivanco, Alfonso
Arines, Justo
Olvera-Angeles, Miguel
Acosta, Eva
JAPANESE JOURNAL OF APPLIED PHYSICS, 2020, 59 (SO)

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