Nanoimprint lithography based approach for the fabrication of large-area, uniformly oriented plasmonic arrays

被引：108
作者：
Lucas, Brandon D. [2 ]
Kim, Jin-Sung [1 ]
Chin, Christine [3 ]
Guo, L. Jay [1 ]
机构：
[1] Univ Michigan, Dept Elect Engn & Comp Sci, Solid State Elect Lab, Ann Arbor, MI 48109 USA
[2] Univ Michigan Appl Phys, Ann Arbor, MI 48109 USA
[3] MIT, Dept Mech Engn, Cambridge, MA 02139 USA
来源：
ADVANCED MATERIALS | 2008年 / 20卷 / 06期
关键词：
D O I：
10.1002/adma.200700225
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
Large-area, uniformly oriented plasmonic arrays are fabricated using nanoimprint lithography. Excellent control of the Localized Surface Plasmon Resonance of the metallic arrays is demonstrated through nanoparticle material composition, size characteristics and polarization effects. This method offers a promising fabrication alternative to exploit LSPR-based applications such as biosensing and surface-enhanced spectroscopies.
引用
收藏
页码：1129 / +
页数：7
相关论文
共 28 条
  • [1] The new p-n junction": Plasmonics enables photonic access to the nanoworld"
    Harry A. Atwater
    Stefan Maier
    Albert Polman
    Jennifer A. Dionne
    Luke Sweatlock
    [J]. MRS Bulletin, 2005, 30 (5) : 385 - 389
  • [2] Electromagnetic interactions in plasmonic nanoparticle arrays
    Bouhelier, A
    Bachelot, R
    Im, JS
    Wiederrecht, GP
    Lerondel, G
    Kostcheev, S
    Royer, P
    [J]. JOURNAL OF PHYSICAL CHEMISTRY B, 2005, 109 (08) : 3195 - 3198
  • [3] CANFIELD BK, 2005, APPL PHYS LETT, P86
  • [4] Imprint lithography with sub-10 nm feature size and high throughput
    Chou, SY
    Krauss, PR
    [J]. MICROELECTRONIC ENGINEERING, 1997, 35 (1-4) : 237 - 240
  • [5] Dirix Y, 1999, ADV MATER, V11, P223, DOI 10.1002/(SICI)1521-4095(199903)11:3<223::AID-ADMA223>3.0.CO
  • [6] 2-J
  • [7] Extraordinary optical transmission through sub-wavelength hole arrays
    Ebbesen, TW
    Lezec, HJ
    Ghaemi, HF
    Thio, T
    Wolff, PA
    [J]. NATURE, 1998, 391 (6668) : 667 - 669
  • [8] Solution-phase, triangular Ag nanotriangles fabricated by nanosphere lithography
    Haes, AJ
    Zhao, J
    Zou, SL
    Own, CS
    Marks, LD
    Schatz, GC
    Van Duyne, RP
    [J]. JOURNAL OF PHYSICAL CHEMISTRY B, 2005, 109 (22) : 11158 - 11162
  • [9] Dichroic optical properties of extended nanostructures fabricated using angle-resolved nanosphere lithography
    Haynes, CL
    Van Duyne, RP
    [J]. NANO LETTERS, 2003, 3 (07) : 939 - 943
  • [10] Plasmonic properties of film over nanowell surfaces fabricated by nanosphere lithography
    Hicks, EM
    Zhang, XY
    Zou, SL
    Lyandres, O
    Spears, KG
    Schatz, GC
    Van Duyne, RP
    [J]. JOURNAL OF PHYSICAL CHEMISTRY B, 2005, 109 (47) : 22351 - 22358
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