共 2 条
[1]
*MYERS ASS, 1999, WW CENS ICP ICPMS
[2]
THOMAS J, 2000, ICP MS J JUL
New developments in ICP-MS
被引：0
作者：
Gluodenis, T
Potter, D
McCurdy, E
机构：
[1] Agilent Technol, Wilmington, DE 19808 USA
[2] Agilent Technol, Manchester, Lancs, England
关键词：
D O I：
暂无
中图分类号：
O65 [分析化学];
学科分类号：
070302 ;
081704 ;
摘要：
The demands on analytical chemists who analyze metal samples are becoming increasingly more exacting. The demands include ultrahigh throughput for a wide range of samples, high sub-ppt sensitivity, information on speciation, and all at a lower cost. In this environment, the instrument of choice has become the ICP-MS. The series of instruments described in this article has been designed to meet today's requirements. All models are based on the same mainframe but with different features and software to meet the specific needs of various industries and applications.
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页码：32 / +
页数：5
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