Surface roughening during ion-assisted film deposition

被引：4

作者：

Carter, G ^{[1
]}

机构：

[1] Univ Salford, Dept Phys, Joule Lab, Salford M5 4WT, Lancs, England

来源：

THIN SOLID FILMS | 1998年 / 322卷 / 1-2期

关键词：

surface roughening; ion irradiation; film deposition;

D O I：

10.1016/S0040-6090(97)01012-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The surface roughening of films deposited atomically and eroded by ion irradiation sputtering, resulting from the stochastic or noisy natures of these processes, is investigated analytically. Serial modes of successive deposition and irradiation and parallel modes of congruent deposition and irradiation are compared and the superiority of one or the other mode shown to depend upon growth and erosion-rate ratios. Different surface relaxation processes including viscous flow and surface diffusion are examined and shown to affect both the average surface roughness and the spatial frequency spectrum of the roughness. (C) 1998 Elsevier Science S.A. All rights reserved.

引用

页码：177 / 187

页数：11

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