Effect of indium (In) on corrosion and passivity of a beta-type Ti-Nb alloy in Ringer's solution

被引:48
作者
Gebert, Annett [1 ]
Oswald, Steffen [1 ]
Helth, Arne [1 ,2 ]
Voss, Andrea [1 ]
Gostin, Petre Flaviu [1 ]
Rohnke, Marcus [3 ]
Janek, Juergen [3 ]
Calin, Mariana [1 ]
Eckert, Juergen [1 ,2 ]
机构
[1] IFW Dresden, Inst Complex Mat, D-01171 Dresden, Germany
[2] Tech Univ Dresden, Inst Mat Sci, D-01062 Dresden, Germany
[3] Univ Giessen, D-35392 Giessen, Germany
关键词
Titanium alloy; Metal release; Passive film; XPS; ToF-SIMS; Biomedical; BEHAVIOR; TITANIUM; XPS; CYTOTOXICITY; TEMPERATURE; TI-6AL-7NB; IMPLANTS; ELEMENTS; AES;
D O I
10.1016/j.apsusc.2015.02.058
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Beta-phase Ti-Nb-based alloys are considered as new generation of biomaterials with improved mechanical compatibility for load-bearing implant applications. Small homogeneously dissolved In additions have a positive impact on the elastic properties of beta-type Ti-40Nb. For (Ti-40Nb)-41n the best match between low Young's modulus, high elastic energy and appropriate strength was achieved. In the present study the effect of In addition to Ti-40Nb on the corrosion and passivation behavior in Ringer's solution is assessed by means of potentiodynamic polarization, ICP-OES metal release analysis, XPS and ToFSIMS for passive film characterization. Like Ti-40Nb, (Ti-40Nb)-41n exhibits very low corrosion rates (i(corr) = 0.1-0.2 mu A/cm(2)) and stable anodic passivity (i(pass) = 3-4 mu A/cm(2)). Small In additions do not have a detectable effect on the anodic response of the alloy. For both beta-phase alloys metal release rates are below the quantification limits of ICP-OES. Their strong passivating nature is governed by the formation of thin barrier-type Ti- and Nb-oxide films. Passive films on (Ti-40Nb)-4In surfaces which were formed during OCP exposure or anodic polarization comprise oxidized In species (In2O3, In(OH3)). From the viewpoint of corrosion stability (Ti-40Nb)-41n appears to be suitable for implant applications. 2015 Published by Elsevier B.V.
引用
收藏
页码:213 / 222
页数:10
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