The XRD Patterns Analysis of Diamond/Porous Composite Membrane Deposited by Bias Voltage Assisted HFCVD

被引:0
|
作者
Zhao, Cong-cong [1 ]
Li, Xiao-wei [1 ]
Chen, Xi-ming [1 ]
Chang, Ming [1 ]
机构
[1] TianJin Univ Technol, TianJin Key Lab Thin Film Elect & Commun Devices, Tianjin 300384, Peoples R China
来源
APPLIED SCIENCE, MATERIALS SCIENCE AND INFORMATION TECHNOLOGIES IN INDUSTRY | 2014年 / 513-517卷
关键词
BDD; porous titanium; XRD patterns analysis; HFCVD; BORON-DOPED DIAMOND;
D O I
10.4028/www.scientific.net/AMM.513-517.7
中图分类号
TU [建筑科学];
学科分类号
0813 ;
摘要
Bias voltage assisted hot filament chemical vapor deposition (HFCVD) was adopted to deposit boron-doped diamond (BDD) film on porous titanium substrate, and diamond composite membrane materials were prepared and characterized by X-ray diffraction method. The influence of carbon concentration, boron source concentration, substrate temperature were discussed respectively on the diamond quality and the transition layer TiC. Results showed that: The concentration of carbon source was related to crystal orientation and the growth rate of diamond. The increase of diamond nucleation density and growth rate prevented the formation of TiC, and improved adhesion between diamond and the substrate; The increasing of boron source concentration promoted the orientation growth of diamond film (111) lattice plane, while reduced the content of TiC; Temperature affected the formation of TiC, and TiC diffraction peaks intensity decreased with the increase of substrate temperature; As the substrate temperature increased, secondary nucleation rate caused cauliflower-like structure which dominated growth mechanism transitting from MCD (Microcrystalline diamond) to the NCD (Nanocrystalline diamond).
引用
收藏
页码:7 / 11
页数:5
相关论文
共 46 条
  • [21] Influence of bias voltage on microstructure and properties of Al-containing diamond-like carbon films deposited by a hybrid ion beam system
    Dai, Wei
    Ke, Peiling
    Wang, Aiying
    SURFACE & COATINGS TECHNOLOGY, 2013, 229 : 217 - 221
  • [22] Effect of DC bias voltage on the optical properties of TiO2 thin film deposited by plasma assisted electron beam evaporation
    Hong, S. K.
    Jung, S. B.
    Kim, Y. C.
    Kee, W. K.
    Kang, C. S.
    THERMEC 2006, PTS 1-5, 2007, 539-543 : 3557 - +
  • [23] Regression Analysis of the Effect of Bias Voltage on Nano- and Macrotribological Properties of Diamond-Like Carbon Films Deposited by a Filtered Cathodic Vacuum Arc Ion-Plating Method
    Miyake, Shojiro
    Shindo, Takanori
    Miyake, Masatoshi
    JOURNAL OF NANOMATERIALS, 2014, 2014
  • [24] Influence of bias voltage on diamond like carbon (DLC) film deposited on polyethylene terephthalate (PET) film surfaces using PECVD and its blood compatibility
    Pandiyaraj, K. Navaneetha
    Selvarajan, V.
    Heeg, J.
    Junge, F.
    Lampka, A.
    Barfels, T.
    Wienecke, M.
    Rhee, Young Ha
    Kim, Hyoung Woo
    DIAMOND AND RELATED MATERIALS, 2010, 19 (7-9) : 1085 - 1092
  • [25] Effects of Bias Voltage on Diamond Like Carbon Coatings Deposited Using Titanium Isopropoxide (TIPOT) and Acetylene/Argon Mixtures onto Various Substrate Materials
    Said, R.
    Ghumman, C. A. A.
    Teodor, O. M. N. D.
    Ahmed, W.
    Abuazza, A.
    Gracio, J.
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2010, 10 (04) : 2552 - 2557
  • [26] Microstructure, mechanical, and wettability properties of Al-doped diamond-like films deposited using a hybrid deposition technique: Bias voltage effects
    Ding, Ji Cheng
    Chen, Mohan
    Mei, Haijuan
    Jeong, Seonghee
    Zheng, Jun
    Yang, Yang
    Wang, Qimin
    Kim, Kwang Ho
    DIAMOND AND RELATED MATERIALS, 2022, 123
  • [27] Tribological analysis of nano-composite diamond-like carbon films deposited by unbalanced magnetron sputtering
    Chang, YY
    Wang, DY
    Chang, CH
    Wu, WT
    SURFACE & COATINGS TECHNOLOGY, 2004, 184 (2-3): : 349 - 355
  • [28] Effect of Substrate Bias Voltage on the Properties of Hafnium Nitride Films Deposited by Radio Frequency Magnetron Sputtering Assisted by Inductive Coupled Nitrogen Plasma
    Heo, Sung Bo
    Lee, Hak Min
    Kim, Daeil
    Choi, Dae Han
    Lee, Byung Hoon
    Kim, Min Gyu
    Lee, Jin Hee
    TRANSACTIONS ON ELECTRICAL AND ELECTRONIC MATERIALS, 2011, 12 (05) : 209 - 212
  • [29] Negative bias effects on deposition and mechanical properties of ultrananocrystalline diamond/amorphous carbon composite films deposited on cemented carbide substrates by coaxial arc plasma
    Ali, Ali M.
    Egiza, Mohamed
    Murasawa, Koki
    Fukui, Yasuo
    Gonda, Hidenobu
    Sakurai, Masatoshi
    Yoshitake, Tsuyoshi
    DIAMOND AND RELATED MATERIALS, 2019, 96 : 67 - 73
  • [30] INFLUENCE OF DC BIAS VOLTAGE ON THE REFRACTIVE-INDEX AND STRESS OF CARBON-DIAMOND FILMS DEPOSITED FROM A CH4/AR RF PLASMA
    AMARATUNGA, GAJ
    SILVA, SRP
    MCKENZIE, DR
    JOURNAL OF APPLIED PHYSICS, 1991, 70 (10) : 5374 - 5379