Optoelectronic integration of polymer waveguide array and metal-semiconductor-metal photodetector through micromirror couplers

被引：33

作者：

Liu, YJ ^{[1
]}

Lin, L ^{[1
]}

Choi, C ^{[1
]}

Bihari, B ^{[1
]}

Chen, RT ^{[1
]}

机构：

[1] Univ Texas, Microelect Res Ctr, Austin, TX 78758 USA

来源：

IEEE PHOTONICS TECHNOLOGY LETTERS | 2001年 / 13卷 / 04期

关键词：

45 degrees micromirror coupler; optical interconnect; optoelectronics integration; polymer waveguide;

D O I：

10.1109/68.917851

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We report the design and formation of a high-performance polymer waveguide array with 45 degrees micromirror couplers for achieving fully embedded board-level optoelectronic interconnects. We have used Si CMOS process compatible polymer as the fabrication material, which is relatively easy to process and has low propagation loss at 850-nm wavelength. 45 degrees total interior reflection (TIR) micromirror couplers fabricated within the channel waveguides provide surface-normal light coupling between the waveguide and the optoelectronic devices, thus forming a fully embedded three-dimensional optoelectronic interconnect. We have demonstrated a hybrid optoelectronic integrated system of GaAs MSM photodetector array and polymer channel waveguide array with 45 degrees micromirror couplers, showing an aggregate 3-dB bandwidth of 32 GHz.

引用

页码：355 / 357

页数：3

共 12 条

[1] DIRECTIONAL REACTIVE ION ETCHING AT OBLIQUE ANGLES [J].