Numerical investigations on requirements for BARC materials for hyper NA immersion lithography

被引：2
|
作者：
Matsuzawa, NN [1 ]
Watanabe, Y [1 ]
Thuunakart, B [1 ]
Ozawa, K [1 ]
Yamaguchi, Y [1 ]
Ikeda, R [1 ]
Kawahira, H [1 ]
机构：
[1] Sony Corp, Semicond Technol Dev Grp, Proc Dev Div, Lithog Technol Dept,Semicond Network Solut Co, Atsugi, Kanagawa 2430014, Japan
来源：
JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY | 2005年 / 18卷 / 05期
关键词：
dual BARC; immersion lithography; hyper NA; index of refraction;
D O I：
10.2494/photopolymer.18.587
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
Requirement on substrate reflectance was estimated numerically based on an optical simulation for hyper-NA (numerical aperture) lithography with the water immersion technique. Conditions to minimize the substrate reflectance were further calculated for dual BARC (bottom antireflective coating) layers with NA varying from 1.0 to 1.4. In addition, margins of the conditions were estimated based on the requirements on substrate reflectance. Based on these numerical results, requirements for materials to be used for dual BARC layers are discussed.
引用
收藏
页码：587 / 592
页数：6
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