Proposed single-exposure holographic fabrication of microsphere-type photonic crystals through phase-mask techniques

被引：29

作者：

Lin, Y ^{[1
]}

Herman, PR

Abolghasemi, EL

机构：

[1] Univ Texas Pan Amer, Dept Phys & Geol, Edinburg, TX 78541 USA

[2] Univ Toronto, Dept Elect & Comp Engn, Toronto, ON M5S 3G4, Canada

来源：

JOURNAL OF APPLIED PHYSICS | 2005年 / 97卷 / 09期

关键词：

D O I：

10.1063/1.1881792

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We propose a design of phase mask for a single-exposure fabrication of microsphere-type photonic crystals by means of holographic lithography. The photonic crystal could have body-centered tetragonal, body-centered cubic, face-centered cubic, or face-centered tetragonal symmetry. Detailed band-gap calculations elucidate effects of macroscopic and microscopic structural parameters on the formation of photonic full band gaps. (C) 2005 American Institute of Physics.

引用

页数：3