Proposed single-exposure holographic fabrication of microsphere-type photonic crystals through phase-mask techniques

被引:29
作者
Lin, Y [1 ]
Herman, PR
Abolghasemi, EL
机构
[1] Univ Texas Pan Amer, Dept Phys & Geol, Edinburg, TX 78541 USA
[2] Univ Toronto, Dept Elect & Comp Engn, Toronto, ON M5S 3G4, Canada
关键词
D O I
10.1063/1.1881792
中图分类号
O59 [应用物理学];
学科分类号
摘要
We propose a design of phase mask for a single-exposure fabrication of microsphere-type photonic crystals by means of holographic lithography. The photonic crystal could have body-centered tetragonal, body-centered cubic, face-centered cubic, or face-centered tetragonal symmetry. Detailed band-gap calculations elucidate effects of macroscopic and microscopic structural parameters on the formation of photonic full band gaps. (C) 2005 American Institute of Physics.
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页数:3
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