Atomic-layer stacking dependence of the magnetocrystalline anisotropy in Fe-Co multilayer thin films at MgO(001) interface

被引:0
作者
Nakamura, K. [1 ]
Nozaki, K. [1 ]
Hayashi, K. [1 ]
Pradipto, A. -M. [2 ]
Weinert, M. [3 ]
Oguchi, T. [4 ]
机构
[1] Mie Univ, Grad Sch Engn, Tsu, Mie 5148507, Japan
[2] Inst Teknol Bandung, Fac Math & Nat Sci, Bandung 40132, Indonesia
[3] Univ Wisconsin, Dept Phys, Milwaukee, WI 53201 USA
[4] Osaka Univ, Inst Sci & Ind Res, Osaka, Ibaraki 5670047, Japan
基金
美国国家科学基金会;
关键词
Magnetocrystalline anisotropy; atomic-layer stacking dependence; first-principles calculations; ELECTRONIC-STRUCTURE; MAGNETIC-ANISOTROPY; ALL-ELECTRON; ENERGY; IRON; MGO;
D O I
10.1016/j.jmmm.2021.168175
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Magnetocrystalline anisotropy (MA) and electric-field-induced modification of the MA energy (E-field-induced MA modification) of Co-Fe multilayer thin films at MgO(001) interface with respect to atomic-layer stacking were investigated using first-principles calculations combined with the cluster expansion method. Although the magnetic quantities have very complicated dependence on atomic-layer stacking, we find that there are key short-range atomic-layer stackings. At the MgO interface, a double atomic-layer stacking of Fe on the MgO enhances an interfacial perpendicular MA while there is no role of the short-range stacking in the E-field-induced MA modification where a single Fe atomic-layer at the interface plays a role. The physical origins underlying these trends were subsequently elucidated by band structure calculations.
引用
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页数:8
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