A NIXSW and NEXAFS investigation of thiophene on Cu(111)

被引：27
|
作者：
Milligan, P
McNamarra, J
Murphy, B
Cowie, BCC
Lennon, D
Kadodwala, M [1 ]
机构：
[1] Univ Glasgow, Dept Chem, Glasgow G12 8QQ, Lanark, Scotland
[2] CLRC Daresbury Lab, Warrington WA4 4AD, Cheshire, England
来源：
SURFACE SCIENCE | 1998年 / 412-13卷
关键词：
chemisorption; copper; NIXSW; thiophene;
D O I：
10.1016/S0039-6028(98)00384-7
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
The local registry and geometry of thiophene at sub-monolayer coverages on Cu(111) has been probed with normal incidence X-ray standing wavefield absorption (NIXSW) and near edge X-ray absorption fine structure (NEXAFS). Thiophene was found to adopt a flat geometry on the surface with the sulphur atom in an atop position. The relatively short data collection times required for the NIXSW technique were found to be beneficial when looking at thiophene overlayers which are sensitive to X-ray induced damage. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：166 / 173
页数：8
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