An electrochemical etching procedure for fabricating scanning tunneling microscopy and atom-probe field-ion microscopy tips

被引：15
|
作者：
Kim, YC
Seidman, DN
机构：
[1] Korea Univ Technol & Educ, Dept Mat Engn, Cheonan 330708, South Korea
[2] Northwestern Univ, Robert R McCormick Sch Engn & Appl Sci, Dept Mat Sci & Engn, Evanston, IL 60208 USA
[3] Northwestern Univ, Robert R McCormick Sch Engn & Appl Sci, Mat Res Ctr, Evanston, IL 60208 USA
来源：
METALS AND MATERIALS INTERNATIONAL | 2003年 / 9卷 / 04期
基金：
美国国家科学基金会;
关键词：
tips; STM; FIM; electrochemical etching;
D O I：
10.1007/BF03027195
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A two-step electrochemical etching procedure is developed to control the sharpness and shape of tips used for either scanning tunneling microscopy (STM) or atom-probe field-ion microscopy (APFIM). The formation of a neck near a tip's apex is controlled by carefully limiting the amount of chemical solution in contact with the area of the neck. Reproducible, atomically sharp, and appropriately tapered tips can be manually produced with this procedure.
引用
收藏
页码：399 / 404
页数：6
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