Structural and electrochromic properties of TiO2 thin films prepared by metallorganic chemical vapor deposition

被引：30
作者：
Khalifa, Z. S. [1 ,2 ]
Lin, H. [1 ]
Shah, S. Ismat [1 ,3 ]
机构：
[1] Univ Delaware, Dept Mat Sci & Engn, Newark, DE 19716 USA
[2] Beni Suef Univ, Dept Phys, Bani Suwayf 62111, Egypt
[3] Univ Delaware, Dept Phys & Astron, Newark, DE 19716 USA
来源：
THIN SOLID FILMS | 2010年 / 518卷 / 19期
关键词：
Metallorganic Chemical Vapor Deposition; Photochromic property; Thin films; Titanium dioxide; Voltammetry; X-ray diffraction; TITANIUM-DIOXIDE; ELECTROCHEMICAL PROPERTIES; SOL; PRECURSOR; ANATASE; FABRICATION; EFFICIENCY; INSERTION;
D O I：
10.1016/j.tsf.2010.04.013
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Titanium dioxide thin films were deposited by Metallorganic Chemical Vapor Deposition at substrate temperatures ranging from 250 degrees C to 450 degrees C over soda lime glass and indium tin oxide coated glass substrates. X-ray diffraction studies show that films have a crystalline anatase structure at all the deposition temperatures. Particle size decreases and texture changes with the increase in substrate temperature. X-ray photoelectron spectroscopy confirms the appearance of a new well resolved state in the core level of Ti 2p spectrum shifted by 1.16 eV to lower binding energy due to the reduction of Ti+4 to Ti+3 upon litheation. Chronoamperometery, cyclic voltammetery and in situ UV-Vis spectrophotometeric studies were carried out on the prepared samples. Particle size and crystallinity control the electrochromic performance. The 350 degrees C film shows the highest ion storage capacity and the highest optical modulation along with an appreciable band gap broadening. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码：5457 / 5462
页数：6
相关论文
共 32 条
  • [1] Kinetic and mechanistic study on the chemical vapor deposition of titanium dioxide thin films by in situ FT-IR using TTIP
    Ahn, KH
    Park, YB
    Park, DW
    [J]. SURFACE & COATINGS TECHNOLOGY, 2003, 171 (1-3) : 198 - 204
  • [2] Fabrication and characterization of sputtered titanium dioxide films
    Akl, A. A.
    Kamal, H.
    Abdel-Hady, K.
    [J]. APPLIED SURFACE SCIENCE, 2006, 252 (24) : 8651 - 8656
  • [3] [Anonymous], 2001, Mat. Res, DOI DOI 10.1590/S1516-14392001000300014
  • [4] INFLUENCE OF SUBSTRATE ON STRUCTURAL-PROPERTIES OF TIO2 THIN-FILMS OBTAINED VIA MOCVD
    BATTISTON, GA
    GERBASI, R
    PORCHIA, M
    MARIGO, A
    [J]. THIN SOLID FILMS, 1994, 239 (02) : 186 - 191
  • [5] ANOMALOUS OPTICAL ABSORPTION LIMIT IN INSB
    BURSTEIN, E
    [J]. PHYSICAL REVIEW, 1954, 93 (03): : 632 - 633
  • [6] Structural, optical and electrical characterization of spray-deposited TiO2 thin films
    Deshmukh, H. P.
    Shinde, P. S.
    Patil, P. S.
    [J]. MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY, 2006, 130 (1-3): : 220 - 227
  • [7] Electrochromic properties of TiO2 anatase thin films prepared by a dipping sol-gel method
    Dinh, NN
    Oanh, NTT
    Long, PD
    Bernard, MC
    Goff, AHL
    [J]. THIN SOLID FILMS, 2003, 423 (01) : 70 - 76
  • [8] HISTORY AND PRINCIPLES OF THE SOL-GEL PROCESS, AND SOME NEW MULTICOMPONENT OXIDE COATINGS
    DISLICH, H
    HINZ, P
    [J]. JOURNAL OF NON-CRYSTALLINE SOLIDS, 1982, 48 (01) : 11 - 16
  • [9] GLOCKER DA, 1997, HDB THIN FILM PROCES
  • [10] Photoelectrochemical cells
    Grätzel, M
    [J]. NATURE, 2001, 414 (6861) : 338 - 344
1234