STM study of oxygen intercalation at the graphene/Ni(111) interface

被引：11

作者：

Kovalenko, S. L. ^{[1
]}

Andryushechkin, B., V ^{[1
,2
]}

Eltsov, K. N. ^{[1
,2
]}

机构：

[1] Russian Acad Sci, Prokhorov Gen Phys Inst, Vavilov Str 38, Moscow 119991, Russia

[2] Natl Res Univ Higher Sch Econ, Myasnitskaya Str 20, Moscow 101000, Russia

来源：

CARBON | 2020年 / 164卷

基金：

俄罗斯基础研究基金会;

关键词：

Nickel; Oxygen; Graphene; Scanning tunneling microscopy; EPITAXIAL GRAPHENE; NI(111); METALS; LAYER; UNDERNEATH;

D O I：

10.1016/j.carbon.2020.03.054

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

This paper reports an STM study of all stages of the intercalation of oxygen at the interface of a strongly coupled graphene/Ni(111) system prepared by temperature programmed growth (TPG) method. We have found that at the first stage of the intercalation at 120 degrees C, oxygen forms a chemisorbed layer on Ni(111) with a coverage about 0.26-0.28 ML, approximately described by the compressed p(2 x 2) lattice. The second stage of the intercalation is the formation of a single NiO(100) layer visualized in STM images as a specific 'square' superstructure at the graphene/Ni(111) interface. It was also established that the rate of the oxygen intercalation at 250 degrees C is much higher than at 120 degrees C. After intercalation at 250 degrees C, STM also reveals the formation of regions with 'free-standing' graphene, associated with the presence of a double nickel oxide layer underneath. (C) 2020 Elsevier Ltd. All rights reserved.

引用

页码：198 / 206

页数：9

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