STM study of oxygen intercalation at the graphene/Ni(111) interface

被引：11
|
作者：
Kovalenko, S. L. [1 ]
Andryushechkin, B., V [1 ,2 ]
Eltsov, K. N. [1 ,2 ]
机构：
[1] Russian Acad Sci, Prokhorov Gen Phys Inst, Vavilov Str 38, Moscow 119991, Russia
[2] Natl Res Univ Higher Sch Econ, Myasnitskaya Str 20, Moscow 101000, Russia
来源：
CARBON | 2020年 / 164卷
基金：
俄罗斯基础研究基金会;
关键词：
Nickel; Oxygen; Graphene; Scanning tunneling microscopy; EPITAXIAL GRAPHENE; NI(111); METALS; LAYER; UNDERNEATH;
D O I：
10.1016/j.carbon.2020.03.054
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
This paper reports an STM study of all stages of the intercalation of oxygen at the interface of a strongly coupled graphene/Ni(111) system prepared by temperature programmed growth (TPG) method. We have found that at the first stage of the intercalation at 120 degrees C, oxygen forms a chemisorbed layer on Ni(111) with a coverage about 0.26-0.28 ML, approximately described by the compressed p(2 x 2) lattice. The second stage of the intercalation is the formation of a single NiO(100) layer visualized in STM images as a specific 'square' superstructure at the graphene/Ni(111) interface. It was also established that the rate of the oxygen intercalation at 250 degrees C is much higher than at 120 degrees C. After intercalation at 250 degrees C, STM also reveals the formation of regions with 'free-standing' graphene, associated with the presence of a double nickel oxide layer underneath. (C) 2020 Elsevier Ltd. All rights reserved.
引用
收藏
页码：198 / 206
页数：9
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