Optimization of chromium and tannic acid bioremediation by Aspergillus niveus using Plackett-Burman design and response surface methodology

被引：22
作者：
Chaudhary, Prachi [1 ]
Chhokar, Vinod [2 ]
Choudhary, Pragati [2 ]
Kumar, Anil [2 ]
Beniwal, Vikas [1 ]
机构：
[1] Maharishi Markandeshwar Univ, Dept Biotechnol, Mullana 133207, Ambala, India
[2] Guru Jambheshwar Univ Sci & Technol, Dept Bio & Nano Technol, Hisar 125001, Haryana, India
来源：
AMB EXPRESS | 2017年 / 7卷
关键词：
Tannery effluent; A; niveus; Tannic acid; Chromium; Plackett-Burman; RSM; HEXAVALENT CHROMIUM; TANNASE PRODUCTION; GALLIC ACID; TANNERY EFFLUENT; REMOVAL; DEGRADATION; BIOSORPTION; REDUCTION; BACTERIA; NIGER;
D O I：
10.1186/s13568-017-0504-0
中图分类号：
Q81 [生物工程学（生物技术）]; Q93 [微生物学];
学科分类号：
071005 ; 0836 ; 090102 ; 100705 ;
摘要：
A chromium and tannic acid resistance fungal strain was isolated from tannery effluent, and identified as Aspergillus niveus MCC 1318 based on its rDNA gene sequence. The MIC (minimum inhibitory concentration) of the isolate against chromium and tannic acid was found to be 200 ppm and 5% respectively. Optimization of physiochemical parameters for biosorption of chromium and tannic acid degradation was carried out by Plackett-Burman design followed by response surface methodology (RSM). The maximum chromium removal and tannic acid degradation was found to be 92 and 68% respectively by A. niveus. Chromium removal and tannic acid degradation was increased up to 11 and 6% respectively after optimization. Scanning electron microscopy (SEM) and Fourier transform infrared spectroscopy (FTIR) was used to investigate biosorption phenomena.
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页数：12
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