Tensile measurement of single crystal gallium nitride nanowires on MEMS test stages

被引:54
作者
Brown, J. J. [1 ,5 ]
Baca, A. I. [1 ,5 ]
Bertness, K. A. [2 ,5 ]
Dikin, D. A. [3 ,5 ]
Ruoff, R. S. [4 ,5 ]
Bright, V. M. [1 ,5 ]
机构
[1] Univ Colorado, Dept Mech Engn, Boulder, CO 80309 USA
[2] Natl Inst Stand & Technol, Optoelect Div 815, Boulder, CO 80305 USA
[3] Northwestern Univ, Dept Mech Engn, Evanston, IL 60208 USA
[4] Univ Texas Austin, Dept Mech Engn, Austin, TX 78712 USA
[5] Univ Colorado, DARPA Ctr Integrated Micro Nanoelectromech Transd, Boulder, CO 80309 USA
基金
美国国家科学基金会;
关键词
Tensile Loading; Gallium Nitride; Nanowire; Single Crystal; Mechanical Testing; MEMS; GAN; CONTACTS;
D O I
10.1016/j.sna.2010.04.002
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reports direct tensile tests on n-type (Si-doped) gallium nitride single crystal nanowires(1) that were grown by nitrogen plasma-assisted molecular beam epitaxy and which are essentially free of defects and residual strain. Nanowires were integrated with actuated, active microelectromechanical (MEMS) devices using dielectrophoresis-driven self-assembly and platinum-carbon clamps created using a gallium focused ion beam. For one nanowire, failure strain of 0.042 +/- 0.011 was found. Most nanowire specimens appeared to demonstrate tensile strength in the range of 4.0 +/- 1.7 GPa to 7.5 +/- 3.4 GPa. Failure modes included clamp failure, transverse (nanowire c-plane) fractures, and insufficient force from the MEMS test actuator. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:177 / 186
页数:10
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