Scratch-resistant improvement of sol-gel derived nano-porous silica films

被引：35

作者：

Wang, J ^{[1
]}

Wu, GM

Shen, J

Yang, TH

Zhang, QY

Zhou, B

Deng, ZS

Fan, B

Zhou, DP

Zhang, FS

机构：

[1] Tongji Univ, Pohl Inst Solid State Phys, Shanghai 200092, Peoples R China

[2] Chinese Acad Sci, Shanghai Inst Tech Phys, Shanghai 200083, Peoples R China

来源：

JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY | 2000年 / 18卷 / 03期

基金：

中国国家自然科学基金;

关键词：

sol-gel process; silica film; AFM; refractive index;

D O I：

10.1023/A:1008787722437

中图分类号：

TQ174 [陶瓷工业]; TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Scratch-resistance of sol-gel derived nano porous silica films were studied. The thin films were prepared with a dip-coating method from both one-step and two-step catalyzed silica sols, and treated in a mixture gas of ammonia and water vapour afterwards. The thin films were characterized by using Atomic Force Microscope (AFM), ellipsometer, Fourier-transform Infrared Spectroscope (FTIR), respectively. Experimental results have shown that the two-step catalysis remarkably improves strength of the films, and abrasion-resistance and adhesion of the silica films were further increased after the mixture gas treatment. It is attributed to the cross-linking of silica particles in the sols by randomly branched or/and entangled linear chains and more Si-O-Si bonds formed by the mixture gas treatment.

引用

页码：219 / 224

页数：6

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