Exploring Topological Defects in Epitaxial BiFeO3 Thin Films

被引:121
|
作者
Vasudevan, Rama K. [2 ]
Chen, Yi-Chun [3 ]
Tai, Hsiang-Hua [3 ]
Balke, Nina [1 ]
Wu, Pingping [4 ]
Bhattacharya, Saswata [4 ]
Chen, L. Q. [4 ]
Chu, Ying-Hao [5 ]
Lin, I-Nan [6 ]
Kalinin, Sergei V. [1 ]
Nagarajan, Valanoor [2 ]
机构
[1] Oak Ridge Natl Lab, Ctr Nanophase Mat Sci, Oak Ridge, TN 37831 USA
[2] Univ New S Wales, Sch Mat Sci & Engn, Sydney, NSW 2052, Australia
[3] Natl Cheng Kung Univ, Dept Phys, Tainan 701, Taiwan
[4] Penn State Univ, Dept Mat Sci & Engn, University Pk, PA 16802 USA
[5] Natl Chiao Tung Univ, Dept Mat Sci & Engn, Hsinchu 30010, Taiwan
[6] Tamkang Univ, Dept Phys, Tamsui 251, Taiwan
基金
澳大利亚研究理事会;
关键词
BiFeO3; closure-domain; topological defects; multiferroic; thin-film; PPM; FERROELECTRIC DOMAIN-STRUCTURES; STABILITY;
D O I
10.1021/nn102099z
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Using a combination of piezoresponse force microscopy (PFM) and phase-field modeling, we demonstrate ubiquitous formation of center-type and possible ferroelectric closure domain arrangements during polarization switching near the ferroelastic domain walls in (100) oriented rhombohedral BiFeO3. The formation of these topological defects is determined from the vertical and lateral PFM data and confirmed from the reversible changes in surface topography. These observations provide insight into the mechanisms of tip-induced ferroelastic domain control and suggest that formation of topological defect states under the action of local defect- and tip-induced fields is much more common than previously believed.
引用
收藏
页码:879 / 887
页数:9
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