Light-intensity dependence of photocreated defects in hydrogenated amorphous silicon-nitrogen alloy films

被引:3
作者
Kumeda, M
Shimada, M
Kimura, S
Morimoto, A
Shimizu, T
机构
[1] Kanazawa Univ, Fac Engn, Dept Elect & Elect Engn, Kanazawa, Ishikawa 9208667, Japan
[2] Kanazawa Univ, Grad Sch Nat Sci & Technol, Kanazawa, Ishikawa 9208667, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 2003年 / 42卷 / 3A期
关键词
silicon-nitrogen alloy films; Staebler-Wronski effect; ESR; dangling bonds; light-intensity dependence;
D O I
10.1143/JJAP.42.L255
中图分类号
O59 [应用物理学];
学科分类号
摘要
The photocreation of neutral dangling bonds in hydrogenated amorphous silicon obeys a relation of G(2/3)t(1/3), where G is the carrier generation rate and t the illumination time. It is found in the present work that the G-dependence becomes prominently weak with an increase in the nitrogen content for hydrogenated amorphous silicon-nitrogen alloy films without an appreciable change in the t-dependence. No model of the photocreation of dangling bonds available to date can predict such a behavior.
引用
收藏
页码:L255 / L256
页数:2
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