Magnetization profile at the Fe/GaAs(001)-4 x 6 interface

被引:11
作者
Giovanelli, L
Tian, CS
Gastelois, PL
Panaccione, G
Fabrizioli, M
Hochstrasser, M
Galaktionov, M
Back, CH
Rossi, G
机构
[1] TASC, Ist Nazl Fis Mat, INFM, Lab Nazl, I-34012 Trieste, Italy
[2] Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China
[3] CNEN, CDTN, BR-30123970 Belo Horizonte, MG, Brazil
[4] Univ Trieste, I-34100 Trieste, Italy
[5] ETH, Festkorperphys Lab, CH-8093 Zurich, Switzerland
[6] St Petersburg Tech State Univ, St Petersburg Div Expt Phys, St Petersburg 195251, Russia
[7] Univ Regensburg, Inst Phys Expt, D-93040 Regensburg, Germany
[8] Univ Modena, INFM, Dipartimento Fis, I-41100 Modena, Italy
关键词
Fe; Co; GaAs; X-ray magnetic circular dichroism; spin injection;
D O I
10.1016/j.physb.2003.11.048
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The magnetization of a thin Fe film epitaxially grown on GaAs(001)-4 x 6 was studied at different depths from the metal/semiconductor interface using a single layer of Fe0.5Co0.5 as a marker layer through a double-wedge Fe film. By measuring the X-ray magnetic circular dichroism spectroscopy at the L-2.3 of Co, the magnetic response of the film could be sensed at different distances from the interface. Data show a reduction of the magnetization at the interface though the existence of a magnetically "dead" layer is completely ruled out. Moreover, the magnetization was found to be reduced at the Fe film surface. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:177 / 180
页数:4
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