Redox Characteristics of Thiol Compounds Using Radicals Produced by Water Vapor Radio Frequency Discharge

被引：14

作者：

Hayashi, Nobuya ^{[1
]}

Nakahigashi, Akari ^{[1
]}

Goto, Masaaki ^{[2
]}

Kitazaki, Satoshi ^{[3
]}

Koga, Kazunori ^{[3
]}

Shiratani, Masaharu ^{[3
]}

机构：

[1] Saga Univ, Fac Sci & Engn, Saga 8408502, Japan

[2] Saga Univ, Fac Med, Saga 8498501, Japan

[3] Kyushu Univ, Grad Sch Informat Sci & Elect Engn, Fukuoka 8190395, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS | 2011年 / 50卷 / 08期

关键词：

PLASMA;

D O I：

10.1143/JJAP.50.08JF04

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The redox reaction between cystein and cystine is observed using radicals produced in water vapor plasma for the control of plant growth. Cystein is oxidized to cystine using the OH radical in the higher-pressure regime and cystine is reduced to cystein by the H radical generated in the lower-pressure regime. Also, the oxidative stress reaction of plants is observed when water vapor plasma is irradiated onto seeds of plants such as radish sprouts. The mechanism of the control of plant growth is explained by the change in thiol compound quantity of the plant cells induced by the radical reaction. (C) 2011 The Japan Society of Applied Physics

引用

页数：5

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