Investigation of the initial growth of cubic-GaN using an AlGaAs buffer layer grown on GaAs (100) by molecular beam epitaxy

被引:6
作者
Kimura, R [1 ]
Takahashi, K [1 ]
机构
[1] Teikyo Univ Sci & Technol, Dept Media Sci, Yamanashi 4090193, Japan
关键词
crystal structure; high resolution X-ray diffraction; nucleation; reflection high energy electron diffraction; molecular beam epitaxy; nitrides; semiconducting III-V materials;
D O I
10.1016/S0022-0248(01)00731-X
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
An investigation of the initial growth mechanism of cubic GaN film during the nitridation of an AlGaAs buffer layer and the initial growth stage of an epilayer by RF-plasma assisted molecular beam epitaxy was carried out using in situ reflection high energy electron diffraction (RHEED), and high resolution X-ray diffraction (HRXRD). It was found that hexagonal GaN nuclei grew on (1 1 1) facet during nitridation of AlGaAs buffer layer, but a highly pure cubic-phase GaN epilayer was grown on the nitrided AlGaAs buffer layer. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:395 / 398
页数:4
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