Microstructure and Wear-resistant SiC Film by RF Magnetron Sputtering

被引：0

作者：

Tian, K. ^{[1
]}

Xu, X. J. ^{[1
]}

Fan, Z. ^{[1
]}

Hao, X. N. ^{[1
]}

Chen, D. ^{[1
]}

Xin, X. L. ^{[1
]}

Sheng, X. L. ^{[1
]}

机构：

[1] Jiangsu Univ, Inst Adv Forming Technol, Zhenjiang 212013, Peoples R China

来源：

FUNCTIONAL AND ELECTRONIC MATERIALS | 2011年 / 687卷

关键词：

SiC film; Friction and wear; Load-bearing capacity; Simulation body fluid; COATINGS;

D O I：

10.4028/www.scientific.net/MSF.687.580

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A wear-resistant SiC (silicon carbon) film on titanium substrate was prepared by magnetron sputtering technology. The film exhibits low nano-hardness of 12.1 GPa and low Young's modulus of 166.2 GPa together with superior friction/wear properties. As sliding against Si3N4 (silicon nitride) ball (2 mm in radius) at room temperature under Kokubo simulation body fluid condition, the film exhibited the friction coefficient of about 0.215 and the special wear rate in the order of magnitude of 10(-5) mm(3)/Nm even at the load of 500g without film cracking and interface delaminating. The high film-cracking and interface-delaminating resistance is due to the low hardness of the film and the good film/substrate modulus match caused by the low elastic modulus of the film.

引用

页码：580 / 584

页数：5

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