Fabrication of three-dimensional photonic crystals using lithographic processes

被引：1

作者：

Prather, DW ^{[1
]}

Peng, Y ^{[1
]}

Schneider, GJ ^{[1
]}

Murakowski, J ^{[1
]}

机构：

[1] Univ Delaware, Dept Elect & Comp Engn, Newark, DE 19716 USA

来源：

MICROMACHINING TECHNOLOGY FOR MICRO-OPTICS AND NANO-OPTICS II | 2004年 / 5347卷

关键词：

photonic crystal devices; nano-fabrication; and interference lithography;

D O I：

10.1117/12.538388

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

In this paper we present lithographic-based fabrication methods for the realization of three-dimensional photonic crystals (PhCs). These methods are based on. novel implementations of single and multi-step UV lithography. To this end, we begin by presenting a technique based on a multi-step process that allows for the stacking. of Planar photonic lattice layers that when repeated in the vertical direction serves to construct a three-dimensional PhC lattice. This process offers the unique ability to implement arbitrary defects, which thereby enables resonant cavities and embedded PhC waveguides. In addition, we also present a process based on three-dimensional interference lithography, which enables the realization of 3D photonic crystal lattices in a single lithographic step. Details of these processes and preliminary experimental results are presented.

引用

页码：224 / 232

页数：9

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