Dewetting dynamics of silicon-on-insulator thin films

被引:57
作者
Cheynis, F. [1 ]
Bussmann, E. [1 ,2 ]
Leroy, F. [1 ]
Passanante, T. [1 ]
Mueller, P. [1 ]
机构
[1] Aix Marseille Univ, CNRS, UPR 3118, CINaM, FR-13288 Marseille, France
[2] Sandia Natl Labs, Photon Microsyst Technol, Albuquerque, NM 87185 USA
来源
PHYSICAL REVIEW B | 2011年 / 84卷 / 24期
关键词
CAPILLARY INSTABILITIES; THERMAL AGGLOMERATION; ELASTIC RELAXATION; EQUILIBRIUM SHAPE; ULTRAHIGH-VACUUM; SURFACE-ENERGY; ISLANDS; SI; DIFFUSION; SUBSTRATE;
D O I
10.1103/PhysRevB.84.245439
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Using low-energy electron microscopy (LEEM), we have measured, in real time, the dewetting of single-crystal Si(001) thin films on amorphous silicon dioxide substrates, which transforms the two-dimensional (2D) thin film into three-dimensional (3D) compact Si nanocrystals. The dewetting scenario has been reported by Bussmann et al. [New J. Phys. 13, 043017 (2011)]. Analytic 2D and 3D models based on simple approximate geometries of the dewetting front have been developed to analyze LEEM measurements. They enable us to estimate the driving force for dewetting E(s) similar to 14 eV/nm(2). Starting from a Si-film thickness dependent effective dewetting activation barrier, a single Si(001) surface self-diffusion energy of E(a) = 2.0 +/- 0.2 eV is derived. First nanoisland-formation dynamics measurements are discussed. Finally, grazing incidence small-angle x-ray scattering (GISAXS) is used to characterize the structure and the morphology of the Si nanocrystals created by the dewetting process.
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页数:9
相关论文
共 47 条
[1]   THE EQUILIBRIUM SHAPE OF SILICON [J].
BERMOND, JM ;
METOIS, JJ ;
EGEA, X ;
FLORET, F .
SURFACE SCIENCE, 1995, 330 (01) :48-60
[2]  
Brandon R., 66095 ROYAL AIRCR ES
[3]   Thermally-induced formation of Si wire array on an ultrathin (111) silicon-on-insulator substrate [J].
Burhanudin, ZA ;
Nuryadi, R ;
Ishikawa, Y ;
Tabe, M ;
Ono, Y .
APPLIED PHYSICS LETTERS, 2005, 87 (12) :1-3
[4]   Dynamics of solid thin-film dewetting in the silicon-on-insulator system [J].
Bussmann, E. ;
Cheynis, F. ;
Leroy, F. ;
Mueller, P. ;
Pierre-Louis, O. .
NEW JOURNAL OF PHYSICS, 2011, 13
[5]   Agglomeration process in thin silicon-, strained silicon-, and silicon germanium-on-insulator substrates [J].
Capellini, G. ;
Ciasca, G. ;
De Seta, M. ;
Notargiacomo, A. ;
Evangelisti, F. ;
Nardone, M. .
JOURNAL OF APPLIED PHYSICS, 2009, 105 (09)
[6]  
Cheynis F., 2011, INT J NANOT IN PRESS, V8
[7]  
Danielson D. T., 2008, THESIS MIT
[8]   Surface-energy-driven dewetting theory of silicon-on-insulator agglomeration [J].
Danielson, David T. ;
Sparacin, Daniel K. ;
Michel, Jurgen ;
Kimerling, Lionel C. .
JOURNAL OF APPLIED PHYSICS, 2006, 100 (08)
[9]   Surface diffusion dewetting of thin solid films:: Numerical method and application to Si/SiO2 [J].
Dornel, E ;
Barbé, JC ;
de Crécy, F ;
Lacolle, G ;
Eymery, J .
PHYSICAL REVIEW B, 2006, 73 (11)
[10]  
Dornell E., 2007, THESIS UJF GRENOBLE