Current crowding and 1/f noise in polycrystalline silicon thin film transistors

被引:20
|
作者
Mercha, A
Vandamme, LKJ
Pichon, L
Carin, R
Bonnaud, O
机构
[1] Univ Caen, Grp Rech Informat Image Instrumentat Caen, CNRS, UMR 6072,ISMRA, F-14050 Caen, France
[2] Eindhoven Univ Technol, Dept Elect Engn, NL-5600 MB Eindhoven, Netherlands
[3] Univ Rennes, Grp Microelect & Visualisat, CNRS, UMR 6076, F-35042 Rennes, France
关键词
D O I
10.1063/1.1404418
中图分类号
O59 [应用物理学];
学科分类号
摘要
Here we investigate dc characteristics, impedance versus frequency, and low frequency noise. The effect of current distribution on 1/f noise in polycrystalline silicon thin film transistors (TFTs) is discussed. We show that the channel impedance versus frequency roll induces spectra that could be misinterpreted above a corner frequency in terms of a frequency index gamma in 1/f(gamma) with gamma higher than 2. Moreover, ignoring the inhomogeneous current distribution leads to overestimation of the noise parameter. Whereas it seemed evident that the noise in TFTs can be interpreted in terms of carrier number fluctuation, the noise parameter variation versus the gate bias can be also understood in terms of mobility fluctuations by including the potential barrier evolution. (C) 2001 American Institute of Physics.
引用
收藏
页码:4019 / 4026
页数:8
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