Molecular dynamics study of the thermal expansion coefficient of silicon

被引:32
作者
Pishkenari, Hossein Nejat [1 ]
Mohagheghian, Erfan [1 ]
Rasouli, Ali [1 ]
机构
[1] Sharif Univ Technol, Nano Robot Lab, Dept Mech Engn, POB 11365-9465, Tehran, Iran
关键词
Molecular dynamics; Silicon; Interatomic potential; Thermal expansion coefficient; THERMODYNAMIC PROPERTIES; INTERATOMIC POTENTIALS; SIMULATION; NANOTUBES; DEFECTS; MODELS; ORDER; FILMS;
D O I
10.1016/j.physleta.2016.08.027
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Due to the growing applications of silicon in nano-scale systems, a molecular dynamics approach is employed to investigate thermal properties of silicon. Since simulation results rely upon interatomic potentials, thermal expansion coefficient (TEC) and lattice constant of bulk silicon have been obtained using different potentials (SW, Tersoff, MEAM, and EDIP) and results indicate that SW has a better agreement with the experimental observations. To investigate effect of size on TEC of silicon nanowires, further simulations are performed using SW potential. To this end, silicon nanowires of different sizes are examined and their TEC is calculated by averaging in different directions ([100], [110], 11111, and [112]) and various temperatures. Results show that as the size increases, due to the decrease of the surface effects, TEC approaches its bulk value. (C) 2016 Elsevier B.V. All rights reserved.
引用
收藏
页码:4039 / 4043
页数:5
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