Microcrystalline Si1-xGex solar cells exhibiting enhanced infrared response with reduced absorber thickness

被引:30
作者
Matsui, Takuya [1 ]
Chang, Chia-Wen [1 ]
Takada, Tomoyuki [1 ,2 ]
Isomura, Masao [2 ]
Fujiwara, Hiroyuki [1 ]
Kondo, Michio [1 ]
机构
[1] Natl Inst Adv Ind Sci & Technol, Res Ctr Photovolta, Tsukuba, Ibaraki 3058568, Japan
[2] Tokai Univ, Dept Elect & Elect Engn, Kanagawa 2591292, Japan
关键词
D O I
10.1143/APEX.1.031501
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thin film p-i-n junction solar cells incorporating hydrogenated microcrystalline Si1-x,Ge-x (mu c-Si1-xGex:H) absorber i layers (1 mu m) have been fabricated by plasma-enhanced chemical vapor deposition in the composition range of 0 <= x <= 0.35. By increasing Ge content from x = 0 to 0.15-0.2, short-circuit current density increases by similar to 5mA/cm(2) with spectral sensitivities extending into the infrared wavelengths (>600 nm). However, solar cell parameters for larger Ge contents (x > 0.2) are lowered by the increased charge carrier recombination in the [mu c-Si1-xGex:H i layer. As a result, a 6.3% efficient solar cell is obtained at x = 0.2, exhibiting infrared response even higher than that of double-thickness pc-Si:H solar cells. The solar cell shows excellent performance stability under prolonged light soaking. (C) 2008 The Japan Society of Applied Physics.
引用
收藏
页码:0315011 / 0315013
页数:3
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