Single-layer silica anti-reflective films modified with polytetramethylene glycol

被引：0
|
作者：
Tian, Hong [1 ]
Yang, Dongjiang [1 ]
Xu, Yao [1 ]
机构：
[1] Chinese Acad Sci, Inst Coal Chem, State Key Lab Coal Convers, Taiyuan 030001, Peoples R China
来源：
OPTOELECTRONIC MATERIALS, PTS 1AND 2 | 2010年 / 663-665卷
关键词：
Anti-reflective films; Sol-Gel process; DAMAGE THRESHOLD; COATINGS;
D O I：
10.4028/www.scientific.net/MSF.663-665.969
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Single-layer silica films modified with polytetramethylene glycol (PTMEG) were prepared via sol-gel process in the presence of NH(4)OH as catalyst. Compared with the pure SiO(2) coating, the hybrid films possessed higher lased-induced damage threshold (LDT). The characterization results from AFM and TEM indicated that the introduction of PTMEG molecules changes the structure of the colloidal silica matrix, which directly resulted in the improvement of the transparency and LDT.
引用
收藏
页码：969 / 973
页数：5
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