Simulation analysis of active particles in plasma polymerization film deposition

被引:0
|
作者
Zhang, Y [1 ]
Jin, XY [1 ]
Chen, KS [1 ]
机构
[1] Dept Informat & Elect Engn, Hangzhou 310027, Peoples R China
关键词
particle energy; Monte Carlo simulation; hydrogen; oxygen; nitrogen; plasma polymerization;
D O I
10.3866/PKU.WHXB20001006
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
The active particles movements in hydrogen, oxygen and nitrogen DC glow discharge plasma have been simulated and analyzed by applying the electromagnetic theories and Monte Carlo simulation techniques, The energy and spatial density distribution graphs have been obtained. By comparison with the active energy range of ions, the results showed that in hydrogen and oxygen plasma there are sufficient active ions to participate in the physical and chemical reactions with the monomer molecules, which resulted in high deposition speed; in nitrogen plasma there are very few ions With sufficient active energy, which resulted in low deposition speed.
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页码:892 / 898
页数:7
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