Mechanism of high luminous efficient discharges with high pressure and high Xe-content in AC PDP

被引：85

作者：

Chung, WJ ^{[1
]}

Shin, BJ

Kim, TJ

Bae, HS

Seo, JH

Whang, KW

机构：

[1] Seoul Natl Univ, Plasma Lab, Sch Elect Engn, Seoul 151742, South Korea

[2] Sejong Univ, Dept Elect Engn, Seoul 143747, South Korea

[3] Univ Incheon, Plasma Display Lab, Inchon 402749, South Korea

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 2003年 / 31卷 / 05期

关键词：

high Xe-contents; luminous efficiency; plasma display panel;

D O I：

10.1109/TPS.2003.818768

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

The mechanism of high luminous efficiency discharges with high Xe content in an ac plasma display panel was analyzed by computer simulation using a two-dimensional fluid model. The model has reproduced well the experimental results. The high luminous efficiency with high Xe content is attributed to high electron heating efficiency as well as high excitation efficiency by electron. The electron heating efficiency is increased with increasing the sustaining voltage under high Xe content and this phenomenon was analyzed by investigating the cathode sheath and secondary electron emission characteristics.

引用

页码：1038 / 1043

页数：6

共 6 条

[1] Global modeling of a dielectric barrier discharge in Ne-Xe mixtures for an alternating current plasma display panel [J].

Ikeda, Y ;

Verboncoeur, JP ;

Christenson, PJ ;

Birdsall, CK .

JOURNAL OF APPLIED PHYSICS, 1999, 86 (05) :2431-2441

[2] Electron ejection from MgO thin films by low energy noble gas ions: Energy dependence and initial instability of the secondary electron emission coefficient [J].

Moon, KS ;

Lee, JW ;

Whang, KW .

JOURNAL OF APPLIED PHYSICS, 1999, 86 (07) :4049-4051

[3] Improvement of the discharge efficiency in plasma displays [J].

Oversluizen, G ;

Klein, M ;

de Zwart, S ;

van Heusden, S ;

Dekker, T .

JOURNAL OF APPLIED PHYSICS, 2002, 91 (04) :2403-2408

[4]

OVERSLUIZEN G, 2002, P SID DIG, P848

[5]

Oversluizen G., 2000, P 7 INT DISPL WORKSH, P631

[6]

SEO JH, 2001, IEEE T PLASMA SCI, V29, P527

← 1 →