Novel Polarization Beam Splitter with High Fabrication Tolerance

被引：0

作者：

Abadia, Nicolas ^{[1
,2
,4
]}

Dai, Xiangyang ^{[3
]}

Lu, Qiaoyin ^{[3
]}

Guo, Wei-Hua ^{[3
]}

Saber, Md. Ghulam ^{[4
]}

Plant, David V. ^{[4
]}

Donegan, John F. ^{[1
,2
]}

机构：

[1] Trinity Coll Dublin, Sch Phys, Semicond Photon Grp, Dublin 2, Ireland

[2] Trinity Coll Dublin, CRANN, Dublin 2, Ireland

[3] Huazhong Univ Sci & Technol, Wuhan Natl Lab Optoelect, Wuhan 430074, Peoples R China

[4] McGill Univ, Dept Elect & Comp Engn, Montreal, PQ H3A 0E9, Canada

来源：

2018 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) | 2018年

关键词：

INDEX; INP;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A highly fabrication tolerant polarization beam splitter is presented. The fabrication tolerances are relaxed by adjusting two voltages. Experiments show on-chip losses of 3.5 dB and extinction ratio of 15 dB at C-band.

引用

页数：2