Factors influencing properties of CrN thin films grown by cylindrical cathodic arc physical vapor deposition on HSS substrates

被引：24
作者：
Valleti, Krishna [1 ]
Rejin, C. [2 ]
Joshi, Shrikant V. [1 ]
机构：
[1] Int Adv Res Ctr Powder Met & New Mat ARCI, Hyderabad, Andhra Pradesh, India
[2] BITS, Pilani, Rajasthan, India
来源：
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING | 2012年 / 545卷
关键词：
Cathodic arc deposition; Hard coatings; Multi layer thin films; CrN; Mechanical properties; NITRIDE COATINGS; PRESSURE; MICROSTRUCTURE; RESISTANCE; WEAR;
D O I：
10.1016/j.msea.2012.02.098
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The present study deals with growth of well-adherent and tough CrN thin films by cylindrical cathodic arc physical vapor deposition. The influence of substrate preparation parameters and deposition variables on film properties has been systematically investigated. The adhesion strength, hardness and crack propagation resistance (CPR) of the films were evaluated for different processing conditions. High substrate hardness and low substrate surface roughness were found to be conducive for obtaining well-adherent films. Cr ion etching was found to yield superior film properties, with the duration of etching also being a key determining factor. The nitrogen partial pressure employed during film deposition was noted to significantly influence the phase combination of the CrNx films as well as the stress levels in the deposited films. In case of multilayer CrNx films, alternating high toughness-low toughness layers were found to yield encouraging properties, with CPR values markedly higher than those obtained in mono-layer CrNx films, with no compromise in either hardness or adhesion strength. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码：155 / 161
页数：7
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