Microfabricated resistive high-sensitivity nanoprobe for scanning thermal microscopy

被引:19
作者
Wielgoszewski, G. [1 ]
Sulecki, P. [1 ]
Gotszalk, T. [1 ]
Janus, P. [2 ]
Szmigiel, D. [2 ]
Grabiec, P. [2 ]
Zschech, E. [3 ]
机构
[1] Wroclaw Univ Technol, Fac Microsyst Elect & Photon, PL-50372 Wroclaw, Poland
[2] Inst Electr Mat Technol, PL-02668 Warsaw, Poland
[3] Fraunhofer Inst Nondestruct Testing, Dresden Branch, D-01109 Dresden, Germany
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2010年 / 28卷 / 06期
关键词
PROBE; SURFACE;
D O I
10.1116/1.3502614
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this article, a novel microfabricated thermoresistive scanning thermal microscopy probe is presented. It is a V-shaped silicon nitride cantilever with platinum lines and a sharp off-plane nanotip. The cantilever fabrication sequence incorporates standard complementary metal oxide semiconductor technology processes and therefore provides high reproducibility, while the tip is additionally processed by focused ion beam, enabling high-sensitivity and high-resolution thermal sensing. The nanoprobe is designed for scanning thermal microscopes, operating in standard atomic force microscope setup with an optical detection system. The measurement setup, which is also presented, takes advantage of the four-point design of the probe by inclusion of a Thomson bridge and a modified Wheatstone bridge measurement electronics. (C) 2010 American Vacuum Society. [DOI:10.1116/1.3502614]
引用
收藏
页码:C6N7 / C6N11
页数:5
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