An investigation into the melting of silicon nanoclusters using molecular dynamics simulations

被引:27
作者
Fang, KC [1 ]
Weng, CI [1 ]
机构
[1] Natl Cheng Kung Univ, Dept Mech Engn, Tainan 70101, Taiwan
关键词
D O I
10.1088/0957-4484/16/2/012
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Using the Stillinger-Weber (SW) potential model, we have performed molecular dynamics (MD) simulations to investigate the melting of silicon nanoclusters comprising a maximum of 9041 atoms. This study investigates the size, surface energy and root mean square displacement (RMSD) characteristics of the silicon nanoclusters as they undergo a heating process. The numerical results reveal that an intermediate nanocrystal regime exists for clusters with more than 357 atoms. Within this regime, a linear relationship exists between the cluster size and its melting temperature. It is found that melting of the silicon nanoclusters commences at the surface and that T-m,T-N = T-M,T-Bulk - alphaN(-1/3). Therefore, the extrapolated melting temperature of the bulk with a surface decreases from T-m,T-Bulk = 1821 K to a value of T-m,T-357 = 1380 K at the lower limit of the intermediate nanocrystal regime.
引用
收藏
页码:250 / 256
页数:7
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