Quantum lithography:: Toward entangled-photon optics

被引:0
作者
Sánchez-Soto, LL
Björk, G
Söderholm, J
机构
[1] Univ Complutense Madrid, Fac Ciencias Fis, Dept Opt, E-28040 Madrid, Spain
[2] Royal Inst Technol, Dept Microelect & Informat Technol, SE-16440 Kista, Sweden
关键词
D O I
10.1134/1.1576833
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The advantages of using nonclassical states of light for optical imaging are discussed, with special emphasis on the new field of quantum optical lithography. The classical resolution limit given by the Rayleigh criterion is approximately half of the optical wavelength. However, it has been argued that, by using special quantum states of light and a multiphoton-sensitive material or detector, this limit can be broken. Here, a brief and rigorous overview of this problem is provided, some particularly widespread misconceptions are addressed, and quantum lithography into a practical technology is discussed. (C) 2003 MAIK "Nauka/Interperiodica".
引用
收藏
页码:666 / 674
页数:9
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