High-pressure magnetron sputtering: gas-phase processes

被引：0

作者：

Znamenskii, AG ^{[1
]}

Marchenko, VA ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Problems Microelect Technol & Especially Pur, Chernogolovka 142432, Moscow Region, Russia

来源：

TECHNICAL PHYSICS | 1998年 / 43卷 / 07期

关键词：

D O I：

暂无

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Thermalization of the energetic atoms emitted by a target at pressures up to 100 Pa causes heating and motion of the gaseous medium. The temperature and velocity of the gas have been measured as a function of the magnetron-discharge parameters. This paper presents the dependences of the deposition rate, the thickness profile, and the film structure on the pressure and the discharge power. If shows that they are well described by a simple diffusion model of the transport of the thermalized atoms of the target that takes into account the motion and, heating of the gaseous medium. (C) 1998 American Institute of Physics. [S1063-7842(98)00507-8].

引用

页码：766 / 773

页数：8

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