Influence of the beam scan direction during focused electron beam induced deposition of 3D nanostructures

被引：37

作者：

Bret, T ^{[1
]}

Utke, I ^{[1
]}

Hoffmann, P ^{[1
]}

机构：

[1] Ecole Polytech Fed Lausanne, Sch Engn, Inst Imaging & Appl Opt, CH-1015 Lausanne, Switzerland

来源：

MICROELECTRONIC ENGINEERING | 2005年 / 78-79卷

关键词：

focused electron beam induced deposition; copper CVD; rapid prototyping; micro- and nanostructures; electron scattering; molecular gas flow;

D O I：

10.1016/j.mee.2005.01.007

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We present evidence that during focused electron beam induced deposition of 3D micro- and nanostructures, different growth rates are obtained when scanning the beam towards different directions, as well as on different sides of a growing structure. The effects of electron scattering are taken into account and shown to account only partially for this observation. We propose an interpretation in terms of gas dynamics around the deposits. Our observation and description of this effect could serve the future design of complex shapes. (c) 2005 Elsevier B.V. All rights reserved.

引用

页码：307 / 313

页数：7

共 28 条

[1] A NEW APPROACH TO FABRICATION OF NANOSTRUCTURES [J].

ARISTOV, VV ;

KASUMOV, AY ;

KISLOV, NA ;

KONONENKO, OV ;

MATVEEV, VN ;

TULIN, VA ;

KHODOS, II ;

GORBATOV, YA ;

NIKOLAICHIK, VI .

NANOTECHNOLOGY, 1995, 6 (02) :35-39

[2] Scanning nanoscale multiprobes for conductivity measurements [J].

Boggild, P ;

Hansen, TM ;

Kuhn, O ;

Grey, F ;

Junno, T ;

Montelius, L .

REVIEW OF SCIENTIFIC INSTRUMENTS, 2000, 71 (07) :2781-2783

[3] Periodic structure formation by focused electron-beam-induced deposition [J].

Bret, T ;

Utke, I ;

Gaillard, C ;

Hoffmann, P .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (05) :2504-2510

[4] In situ control of the focused-electron-beam-induced deposition process [J].

Bret, T ;

Utke, I ;

Bachmann, A ;

Hoffmann, P .

APPLIED PHYSICS LETTERS, 2003, 83 (19) :4005-4007

[5] Surface kinetic study of ion-induced chemical vapor deposition of copper for focused ion beam applications [J].

Chiang, TP ;

Sawin, HH ;

Thompson, CV .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1997, 15 (06) :3104-3114

[6]

CLABES JG, Patent No. 5171992

[7]

De Boer JH., 1968, DYNAMICAL CHARACTER

[8] Lateral growth of focused ion beam deposited platinum for stencil mask repair [J].

DeMarco, AJ ;

Melngailis, J .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06) :3154-3157

[9]

Dushman S., 1962, Scientific Foundations of Vacuum Technique, VSecond

[10] Novel high resolution scanning thermal probe [J].

Edinger, K ;

Gotszalk, T ;

Rangelow, IW .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (06) :2856-2860

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