Sparfloxacin-induced photosensitivity and the occurrence of a lichenoid tissue reaction after prolonged exposure

被引:14
作者
Hamanaka, H [1 ]
Mizutani, H [1 ]
Shimizu, M [1 ]
机构
[1] Mie Univ, Fac Med, Dept Dermatol, Tsu, Mie 5148507, Japan
关键词
D O I
10.1016/S0190-9622(98)70157-4
中图分类号
R75 [皮肤病学与性病学];
学科分类号
100206 ;
摘要
Background: A new antibacterial quinolone, sparfloxacin (SPFX), frequently causes photosensitive dermatitis and sometimes induces a treatment-resistant lichenoid tissue reaction (LTR). Objective: We attempted to determine the factors that induce LTR in SPFX-induced photodermatitis. Methods: Thirteen patients with SPFX photosensitive dermatitis were studied clinically and histopathologically. Results: Six of the 13 patients had acute dermatitis with epidermal spongiosis and focal epidermal HLA-DR and intercellular adhesion molecule-1 (ICAM-1) expression with CD4(+) cell infiltration. The other seven displayed LTR with basal cell liquefaction degeneration and diffuse epidermal HLA-DR and ICAM-1 expression associated with CD8(+) cells. The seven patients with LTR were exposed to UV and SPFX for more than 2 weeks after the appearance of their initial eruption, whereas the six patients with acute dermatitis were treated within 2 weeks. The acute dermatitis lesions cleared significantly within 2 weeks, but the LTR lesions persisted for more than 6 weeks. Conclusion: Patients with quinolone-induced photosensitivity should be treated within 2 weeks of onset to prevent LTR.
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收藏
页码:945 / 949
页数:5
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