Broadband and mid-infrared absorber based on dielectric-thin metal film multilayers

被引：53

作者：

Corrigan, Timothy D. ^{[1
,2
,3
]}

Park, Dong Hun ^{[2
,4
]}

Drew, H. Dennis ^{[1
,2
]}

Guo, Shy-Hauh ^{[2
,5
]}

Kolb, Paul W. ^{[2
]}

Herman, Warren N. ^{[2
]}

Phaneuf, Raymond J. ^{[1
,2
,4
,5
]}

机构：

[1] Univ Maryland, Dept Phys, College Pk, MD 20742 USA

[2] Lab Phys Sci, College Pk, MD 20740 USA

[3] Concord Univ, Dept Phys Sci, Athens, WV 24712 USA

[4] Univ Maryland, Dept Elect Engn, College Pk, MD 20742 USA

[5] Univ Maryland, Dept Mat Sci & Engn, College Pk, MD 20742 USA

来源：

APPLIED OPTICS | 2012年 / 51卷 / 08期

关键词：

OPTICAL-PROPERTIES; ANTIREFLECTION COATINGS; INFRARED ABSORBER; POROUS SILICON; FABRICATION; POWER;

D O I：

10.1364/AO.51.001109

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We propose a periodic multilayer structure of dielectric and metal interlayers to achieve a near-perfect broadband absorber of mid-infrared radiation. We examine the influence of four factors on its performance: (1) the interlayer metal conductance, (2) the number of dielectric layers, (3) a nanopatterned anti-reflective layer, and (4) a reflective metallic bottom layer for backreflection. Absorption characteristics greater than 99% of the 300 K and 500 K blackbody spectra are found for the optimized structures. Incident angle and polarization dependence of the absorption spectra are examined. We also investigate the possibility of fabricating a nanopatterned antireflective layer to maximize absorption. (C) 2012 Optical Society of America

引用

页码：1109 / 1114

页数：6

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