Photoelastic tomography for residual stress measurement in glass

被引：42

作者：

Aben, H ^{[1
]}

Errapart, A ^{[1
]}

Ainola, L ^{[1
]}

Anton, J ^{[1
]}

机构：

[1] Tallinn Univ Technol, Inst Cybernet, Lab Photoelast, EE-12618 Tallinn, Estonia

来源：

OPTICAL ENGINEERING | 2005年 / 44卷 / 09期

关键词：

glass; residual stress; photoelasticity; tomography;

D O I：

10.1117/1.2047368

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

The paper describes an algorithm of photoelastic tomography and its application for residual stress measurement in glass articles of complicated shape. The algorithm is based on a linearized solution of the equations of integrated photoelasticity. The problem of tensor field tomography is decomposed into several problems of scalar field tomography for normal stress components of the stress tensor. The method is implemented with an automated polariscope supplied with a rotary stage. Software for the control of tomographic measurements and for the calculation of the stress fields has been elaborated. Several examples illustrate application of the method. (c) 2005 Society of Photo-Optical Instrumentation Engineers.

引用

页数：8

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