High-intensity laser processing of thin films

被引：4
作者：
Yakovlev, VV [1 ]
Magyar, J [1 ]
Aita, CR [1 ]
Sklyarov, A [1 ]
Mikaylichenko, K [1 ]
机构：
[1] Univ Wisconsin, Dept Phys, Milwaukee, WI 53201 USA
来源：
LASER APPLICATIONS IN MICROELECTRONIC AND OPTOELECTRONIC MANUFACTURING VI | 2001年 / 4274卷
关键词：
laser; ablation; thin films; ceramic; phase transformations; short pulse;
D O I：
10.1117/12.432520
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
We use high intensity nanosecond laser pulses of different wavelengths to modify thin-film coatings (silica and titania) on the surface of silicon. We find that films as thick as I micron can be removed from the surface in one shot with minor or no damage to the Si surface. We also find the accumulated effect of multiple pulse irradiation. Finally we report our preliminary results on phase transformations in titania films induced by high intensity laser.
引用
收藏
页码：212 / 221
页数：4
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