Porous water repellent silica coatings on glass by sol-gel method
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作者:
Gurav, Annaso B.
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Shivaji Univ, Dept Phys, Air Glass Lab, Kolhapur 416004, Maharashtra, IndiaShivaji Univ, Dept Phys, Air Glass Lab, Kolhapur 416004, Maharashtra, India
Gurav, Annaso B.
[1
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Latthe, Sanjay S.
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Shivaji Univ, Dept Phys, Air Glass Lab, Kolhapur 416004, Maharashtra, IndiaShivaji Univ, Dept Phys, Air Glass Lab, Kolhapur 416004, Maharashtra, India
Latthe, Sanjay S.
[1
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Kappenstein, Charles
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Univ Poitiers, Lab Catalysis Organ Chem, LA CCO, UMR CNRS 6503, F-86000 Poitiers, FranceShivaji Univ, Dept Phys, Air Glass Lab, Kolhapur 416004, Maharashtra, India
Kappenstein, Charles
[2
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Mukherjee, S. K.
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Bhabha Atom Res Ctr, Div Fuel Chem, Bombay 400085, Maharashtra, IndiaShivaji Univ, Dept Phys, Air Glass Lab, Kolhapur 416004, Maharashtra, India
Mukherjee, S. K.
[3
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Rao, A. Venkateswara
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Shivaji Univ, Dept Phys, Air Glass Lab, Kolhapur 416004, Maharashtra, IndiaShivaji Univ, Dept Phys, Air Glass Lab, Kolhapur 416004, Maharashtra, India
Rao, A. Venkateswara
[1
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Vhatkar, Rajiv S.
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Shivaji Univ, Dept Phys, Air Glass Lab, Kolhapur 416004, Maharashtra, IndiaShivaji Univ, Dept Phys, Air Glass Lab, Kolhapur 416004, Maharashtra, India
Vhatkar, Rajiv S.
[1
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机构:
[1] Shivaji Univ, Dept Phys, Air Glass Lab, Kolhapur 416004, Maharashtra, India
[2] Univ Poitiers, Lab Catalysis Organ Chem, LA CCO, UMR CNRS 6503, F-86000 Poitiers, France
[3] Bhabha Atom Res Ctr, Div Fuel Chem, Bombay 400085, Maharashtra, India
Development of the solid surfaces with water-repellent and self-cleaning ability has attracted much research interest in recent years. In the present research work, we have prepared water repellent silica coatings on glass at room temperature (similar to 27 A degrees C) by sol gel process and surface silylation technique. Coating sol was prepared by keeping the molar ratio of tetramethoxysilane (TMOS), methanol (MeOH) and water (H(2)O) constant at 1:12.36:4.25, respectively, with 0.01 M NH(4)F. The dip coated silica films were surface silylated using two different silylating agents namely hexamethyldisiloxane (HMDSO) and hexamethyldisilazane (HMDZ). The HMDSO and HMDZ in hexane solvent were varied from 0 to 1 vol.% and silylation period was varied from 1 to 3 h. The HMDSO and HMDZ modified films showed dense and porous surface morphology, respectively. The HMDSO modified silica films showed static water contact angle of 122A degrees whereas HMDZ modified films showed 165A degrees. The HMDZ modified films displayed the extreme water repellency comparing with that of lotus leaves. The silica films were characterized by surface profilometer, scanning electron microscopy, transmission electron microscopy, Fourier transform infrared microscopy, thermal and chemical aging tests, optical transmission and static water contact angle measurements.