EUV lithographic radiation grafting of thermo-responsive hydrogel nanostructures

被引：8

作者：

Farquet, Patrick ^{[1
]}

Padeste, Celestino ^{[1
]}

Solak, Harun H. ^{[1
]}

Guersel, Selmiye Alkan ^{[2
]}

Scherer, Guenther G. ^{[2
]}

Wokaun, Alexander ^{[2
]}

机构：

[1] Paul Scherrer Inst, Lab Micronanotechnol, CH-5232 Villigen, Switzerland

[2] Paul Scherrer Inst, Electrochem Lab, CH-5232 Villigen, Switzerland

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2007年 / 265卷 / 01期

关键词：

nanostructures; block-copolymers; N-isopropyl acrylamide; polymer brushes; hydrogels;

D O I：

10.1016/j.nimb.2007.08.070

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Nanostructures of the thermoresponsive poly(N-isopropyl acrylamide) (PNIPAAm) and of PNIPAAm-block-poly(acrylic acid) copolymers were produced on poly(tetrafluoroethylene-co-ethyelene) (ETFE) films using extreme ultraviolet (EUV) lithographic exposure with subsequent graft-polymerization. The phase transition of PNIPAAm nanostructures at the low critical solution temperature (LCST) at 32 degrees C was imaged by atomic force microscopy (AFM) phase contrast measurements in pure water. Results show a higher phase contrast for samples measured below the LCST temperature than for samples above the LCST, proving that the soft PNIPAAm hydrogel transforms into a much more compact conformation above the LCST. EUV lithographic exposures were combined with the reversible addition-fragment chain transfer (RAFT)-mediated polymerization using cyanoisopropyl dithiobenzoate (CPDB) as chain transfer agent to synthesize PNIPAArn block-copolymer nanostructures. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：187 / 192

页数：6

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