Effect of argon-plasma treatment on the electrical and optical properties antimony-doped tin dioxide thin films fabricated by dip coating

被引：4

作者：

Hammad, T. M. ^{[1
]}

Tamous, H. M. ^{[2
]}

Hejazy, N. K. ^{[3
]}

机构：

[1] Al Azhar Univ, Fac Sci, Dept Phys, Gaza, Gaza Strip, Israel

[2] Al Azhar Univ, Fac Sci, Dept Chem, Gaza, Gaza Strip, Israel

[3] Al Quds Open Univ, Gaza Branch, Dept Educ, Gaza, Gaza, Israel

来源：

INTERNATIONAL JOURNAL OF MODERN PHYSICS B | 2007年 / 21卷 / 25期

关键词：

argon-plasma; electrical; optical; antimony-tin oxide; thin films;

D O I：

10.1142/S0217979207037776

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In this study, antimony-doped tin oxide (ATO) thin films were fabricated by the sol-gel dip coating process on glass substrates. After the deposition process, the films were treated by Argon plasma (Ar-400 Watt). The effect of argon plasma treatments on the electrical and optical properties of ATO thin films was then investigated as a function of the plasma treatment time. It was found that Ar-plasma treatment increased the electrical conductivity of ATO films, but it decreased the optical transmission of ATO thin films.

引用

页码：4399 / 4406

页数：8

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